Home » News » Albany EUV Site Director | Micron Technology Careers

Albany EUV Site Director | Micron Technology Careers

Albany, NY – Micron Technology is actively recruiting a Site Director for its High NA EUV operations in Albany, New York, a key component of the company’s ambitious expansion within the burgeoning semiconductor industry. This leadership role underscores the growing importance of the Albany Nanotech Complex as a national hub for advanced chip research and development, fueled by significant federal and private investment.

The position, posted on Micron’s careers website, comes as the Capital Region prepares to become a central location for next-generation semiconductor technology. The effort is part of a broader national strategy to onshore chip manufacturing and reduce reliance on overseas suppliers. Micron’s investment in Albany is directly tied to the CHIPS and Science Act, which aims to revitalize the U.S. Semiconductor industry and bolster national security. The company’s vision, as stated in the job posting, is “to transform how the world uses information to enrich life for all.”

The Role and the Technology

The High NA EUV Albany Site Director will be responsible for leading all aspects of Micron’s High NA Extreme Ultraviolet (EUV) lithography center at the NY CREATES Albany Nanotech Complex. This includes overseeing operations, ensuring safety, and driving innovation in the development of advanced semiconductor manufacturing processes. High NA EUV lithography is a cutting-edge technology that uses extreme ultraviolet light to etch incredibly small patterns onto silicon wafers, enabling the creation of more powerful and efficient computer chips. According to NY CREATES, the Albany facility will house North America’s first and only publicly-owned High NA EUV Center.

The technology is critical for producing the world’s most complex and powerful semiconductors. Micron secured several of the new ASML High NA EUV machines years ago, and NY CREATES was given a “spot in line” to purchase one of these difficult-to-obtain tools for the Albany site, as reported by the Times Union.

Federal and Private Investment Fuels Growth

The development of the Albany Nanotech Complex as a semiconductor powerhouse is backed by substantial financial commitments. In December 2023, Governor Kathy Hochul announced a $10 billion public-private partnership with industry leaders including IBM, Micron, Applied Materials, and Tokyo Electron to establish a next-generation semiconductor research and development center at the complex. This partnership builds upon an earlier $825 million federal investment, as detailed by syracuse.com, to make Upstate New York a national center for computer chip research.

The Governor’s office announced the grand opening of the CHIPS for America Extreme Ultraviolet (EUV) Accelerator on July 1, 2025, marking a significant milestone in the project’s development. The EUV Accelerator is one of three flagship research and development facilities across the U.S. Established through the NSTC (National Semiconductor Technology Center) program.

Impact on the Capital Region

The expansion of semiconductor research and manufacturing in Albany is expected to create numerous high-skilled jobs and stimulate economic growth in the Capital Region. The High NA EUV Lithography Center will not only benefit Micron’s own research and development efforts but will also provide access to cutting-edge technology for smaller companies that may not be able to afford their own EUV machines. This accessibility is intended to foster innovation and collaboration across the semiconductor ecosystem.

The Albany NanoTech Complex, already North America’s largest and most advanced 300mm semiconductor R&D facility, is poised to play a pivotal role in shaping the future of advanced semiconductor research, and manufacturing. The site director position represents a critical leadership role in this evolving landscape.

As Micron continues to build out its Albany operations, the focus will likely shift towards ramping up research activities and preparing for the commercialization of next-generation semiconductor technologies. The successful implementation of High NA EUV lithography will be crucial for maintaining U.S. Competitiveness in the global semiconductor market.

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